Semicon China 2026

From March 25 to 27, Tonghui Gas was honored to participate in SEMICON China 2026, one of the most influential platforms for the microelectronics industry in China, attracting nearly 180,000 visitors last year.

At this year’s exhibition, we presented our core specialty gas solutions for semiconductor, OLED&LCD and solar energy applications.

Electronic Grade Nitrous Oxide (N2O)

Produced by our subsidiaries, Tonghui Kefa Gas and Tonghui Kesheng Gas, our electronic-grade nitrous oxide is manufactured through a fully integrated process.

Starting from upstream adipic acid gas, the material undergoes compression, liquefaction, rectification, and purification to achieve high purity levels suitable for electronic applications.

Through continuous process optimization—especially in distillation and purification—our R&D team has significantly improved both purity and consistency.

• Annual output exceeds 60,000 tonnes
• High purity suitable for semiconductor-grade applications
• Widely used in LCD panels, photovoltaics, and optoelectronics
• Advanced Manufacturing Upgrade

Ultra-Pure Ammonia (NH3)

Our ultra-pure (7N) ammonia project was launched in 2024, covering a total area of 16,646.7 square meters, including production facilities and supporting infrastructure. After two years of development, the project has reaches an  annual output of 17,000 tonnes.

Phosphine (PH3) & Gas Mixtures

Phosphine (PH3) is a colorless, highly toxic, and flammable gas with a characteristic garlic-like odor. It is widely used in semiconductor and photovoltaic manufacturing.

We provide PH3 as well as customized gas mixtures (H3 / CO3 / Ar) to meet different process requirements.

Key applications include:

Semiconductor & photovoltaic manufacturing:

As an n-type dopant in silicon-based semiconductors (such as CPUs and memory devices) and solar cells, PH₃ is used in phosphorus diffusion processes to form PN junctions. Compared to liquid sources (e.g., POCl₃), gaseous PH₃ enables more uniform diffusion and precise process control

Thin film deposition:

Used in CVD processes to produce III-V compound semiconductors such as indium phosphide (InP) and gallium phosphide (GaP). Also applied in OLED manufacturing to enhance material performance through controlled doping

Connecting with Industry Partners

At SEMICON China 2026, it was great to reconnect with long-term partners and meet new industry players from across the semiconductor ecosystem.

These face-to-face conversations gave us valuable insights into evolving market needs and future cooperation opportunities.

Looking for a reliable specialty gas supplier for semiconductor applications? Let’s connect.